● Mask OPC evaluation and developement in G6,G7.5,G8.5
● New tech. mask import to exceed the photo resolution
● Photo resistance simulation by diversity mask design
+ Dry etching parameter improvement to meet final metrology & critical dimension
+ Investigation of physical etching in RIE, ECCP, ICP equipments.
+ Different etch gas evalution & introduction.
+ Patent writing to protect OPC invention